Structural and optical properties of ITO/TiO2 anti-reflective films for solar cell applications.
Identifieur interne : 000039 ( Main/Exploration ); précédent : 000038; suivant : 000040Structural and optical properties of ITO/TiO2 anti-reflective films for solar cell applications.
Auteurs : RBID : pubmed:24721986Abstract
Indium tin oxide (ITO) and titanium dioxide (TiO2) anti-reflective coatings (ARCs) were deposited on a (100) P-type monocrystalline Si substrate by a radio-frequency (RF) magnetron sputtering. Polycrystalline ITO and anatase TiO2 films were obtained at room temperature (RT). The thickness of ITO (60 to 64 nm) and TiO2 (55 to 60 nm) films was optimized, considering the optical response in the 400- to 1,000-nm wavelength range. The deposited films were characterized by X-ray diffraction (XRD), Raman spectroscopy, field emission scanning electron microscopy (FESEM), energy dispersive spectroscopy (EDS), and atomic force microscopy (AFM). The XRD analysis showed preferential orientation along (211) and (222) for ITO and (200) and (211) for TiO2 films. The XRD analysis showed that crystalline ITO/TiO2 films could be formed at RT. The crystallite strain measurements showed compressive strain for ITO and TiO2 films. The measured average optical reflectance was about 12% and 10% for the ITO and TiO2 ARCs, respectively.
DOI: 10.1186/1556-276X-9-175
PubMed: 24721986
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en">Structural and optical properties of ITO/TiO2 anti-reflective films for solar cell applications.</title><author><name sortKey="Ali, Khuram" uniqKey="Ali K">Khuram Ali</name><affiliation wicri:level="1"><nlm:affiliation>Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, Penang 11800, Malaysia. khuram_uaf@yahoo.com.</nlm:affiliation><country xml:lang="fr">Malaisie</country><wicri:regionArea>Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, Penang 11800</wicri:regionArea></affiliation></author><author><name sortKey="Khan, Sohail A" uniqKey="Khan S">Sohail A Khan</name></author><author><name sortKey="Jafri, Mohd Zubir Mat" uniqKey="Jafri M">Mohd Zubir Mat Jafri</name></author></titleStmt><publicationStmt><date when="2014">2014</date><idno type="doi">10.1186/1556-276X-9-175</idno><idno type="RBID">pubmed:24721986</idno><idno type="pmid">24721986</idno><idno type="wicri:Area/Main/Corpus">000074</idno><idno type="wicri:Area/Main/Curation">000074</idno><idno type="wicri:Area/Main/Exploration">000039</idno></publicationStmt></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">Indium tin oxide (ITO) and titanium dioxide (TiO2) anti-reflective coatings (ARCs) were deposited on a (100) P-type monocrystalline Si substrate by a radio-frequency (RF) magnetron sputtering. Polycrystalline ITO and anatase TiO2 films were obtained at room temperature (RT). The thickness of ITO (60 to 64 nm) and TiO2 (55 to 60 nm) films was optimized, considering the optical response in the 400- to 1,000-nm wavelength range. The deposited films were characterized by X-ray diffraction (XRD), Raman spectroscopy, field emission scanning electron microscopy (FESEM), energy dispersive spectroscopy (EDS), and atomic force microscopy (AFM). The XRD analysis showed preferential orientation along (211) and (222) for ITO and (200) and (211) for TiO2 films. The XRD analysis showed that crystalline ITO/TiO2 films could be formed at RT. The crystallite strain measurements showed compressive strain for ITO and TiO2 films. The measured average optical reflectance was about 12% and 10% for the ITO and TiO2 ARCs, respectively.</div></front></TEI><pubmed><MedlineCitation Owner="NLM" Status="PubMed-not-MEDLINE"><PMID Version="1">24721986</PMID><DateCreated><Year>2014</Year><Month>04</Month><Day>15</Day></DateCreated><DateCompleted><Year>2014</Year><Month>04</Month><Day>15</Day></DateCompleted><DateRevised><Year>2014</Year><Month>04</Month><Day>18</Day></DateRevised><Article PubModel="Electronic"><Journal><ISSN IssnType="Print">1931-7573</ISSN><JournalIssue CitedMedium="Print"><Volume>9</Volume><Issue>1</Issue><PubDate><Year>2014</Year></PubDate></JournalIssue><Title>Nanoscale research letters</Title><ISOAbbreviation>Nanoscale Res Lett</ISOAbbreviation></Journal><ArticleTitle>Structural and optical properties of ITO/TiO2 anti-reflective films for solar cell applications.</ArticleTitle><Pagination><MedlinePgn>175</MedlinePgn></Pagination><ELocationID EIdType="doi" ValidYN="Y">10.1186/1556-276X-9-175</ELocationID><Abstract><AbstractText>Indium tin oxide (ITO) and titanium dioxide (TiO2) anti-reflective coatings (ARCs) were deposited on a (100) P-type monocrystalline Si substrate by a radio-frequency (RF) magnetron sputtering. Polycrystalline ITO and anatase TiO2 films were obtained at room temperature (RT). The thickness of ITO (60 to 64 nm) and TiO2 (55 to 60 nm) films was optimized, considering the optical response in the 400- to 1,000-nm wavelength range. The deposited films were characterized by X-ray diffraction (XRD), Raman spectroscopy, field emission scanning electron microscopy (FESEM), energy dispersive spectroscopy (EDS), and atomic force microscopy (AFM). The XRD analysis showed preferential orientation along (211) and (222) for ITO and (200) and (211) for TiO2 films. The XRD analysis showed that crystalline ITO/TiO2 films could be formed at RT. The crystallite strain measurements showed compressive strain for ITO and TiO2 films. The measured average optical reflectance was about 12% and 10% for the ITO and TiO2 ARCs, respectively.</AbstractText></Abstract><AuthorList CompleteYN="Y"><Author ValidYN="Y"><LastName>Ali</LastName><ForeName>Khuram</ForeName><Initials>K</Initials><Affiliation>Nano-Optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, Penang 11800, Malaysia. khuram_uaf@yahoo.com.</Affiliation></Author><Author ValidYN="Y"><LastName>Khan</LastName><ForeName>Sohail A</ForeName><Initials>SA</Initials></Author><Author ValidYN="Y"><LastName>Jafri</LastName><ForeName>Mohd Zubir Mat</ForeName><Initials>MZ</Initials></Author></AuthorList><Language>eng</Language><PublicationTypeList><PublicationType>Journal Article</PublicationType></PublicationTypeList><ArticleDate DateType="Electronic"><Year>2014</Year><Month>04</Month><Day>11</Day></ArticleDate></Article><MedlineJournalInfo><Country>United States</Country><MedlineTA>Nanoscale Res Lett</MedlineTA><NlmUniqueID>101279750</NlmUniqueID><ISSNLinking>1556-276X</ISSNLinking></MedlineJournalInfo><OtherID Source="NLM">PMC3986428</OtherID></MedlineCitation><PubmedData><History><PubMedPubDate PubStatus="received"><Year>2014</Year><Month>2</Month><Day>7</Day></PubMedPubDate><PubMedPubDate PubStatus="accepted"><Year>2014</Year><Month>4</Month><Day>3</Day></PubMedPubDate><PubMedPubDate PubStatus="aheadofprint"><Year>2014</Year><Month>4</Month><Day>11</Day></PubMedPubDate><PubMedPubDate PubStatus="entrez"><Year>2014</Year><Month>4</Month><Day>12</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="pubmed"><Year>2014</Year><Month>4</Month><Day>12</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="medline"><Year>2014</Year><Month>4</Month><Day>12</Day><Hour>6</Hour><Minute>1</Minute></PubMedPubDate></History><PublicationStatus>epublish</PublicationStatus><ArticleIdList><ArticleId IdType="pii">1556-276X-9-175</ArticleId><ArticleId IdType="doi">10.1186/1556-276X-9-175</ArticleId><ArticleId IdType="pubmed">24721986</ArticleId><ArticleId IdType="pmc">PMC3986428</ArticleId></ArticleIdList></PubmedData></pubmed></record>Pour manipuler ce document sous Unix (Dilib)
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